Overview
The CF4 (Tetrafluoromethane) infrared gas analyzer utilizes high-precision infrared absorption technology (NDIR). It is widely used in semiconductor and flat-panel display manufacturing (plasma etching & CVD chamber cleaning), electronic specialty gas blending, fluorochemical synthesis, and SF6/CF4 insulating gas analysis for power grids. Delivering precise, online measurements of CF4 concentrations in process gas and exhaust lines, it optimizes etching endpoints, monitors chamber cleaning cycles, and evaluates the Destruction and Removal Efficiency (DRE) of greenhouse gas abatement systems.
Principle
Various polyatomic gases (CO, CO2, CH4, etc.) absorb infrared light not the whole band, but only a part of the band, which are called characteristic absorption bands. Different gases have different infrared absorption wavelengths. Infrared photometry analyzer is based on the characteristic of selective absorption of infrared radiation at different wavelengths of certain gases. When infrared light pass through a gas mixture, the measured component of the gas absorbs the infrared radiation energy, according to the Lambert-Beer absorption law, the concentration of a gas can be determined from the change in light intensity.
Application
•Semiconductor & Flat-Panel Display Manufacturing
Plasma Etching Process Control: Continuous monitoring of the supply concentration and stability of CF4 feed gas used in dielectric and silicon plasma etching systems.
CVD Chamber Cleaning Optimization: Real-time analysis of CF4 exhaust profiles during Chemical Vapor Deposition (CVD) chamber cleaning to determine cleaning endpoints, reducing gas consumption and tool downtime.
•PFC Greenhouse Gas Abatement & Environmental Compliance
Destruction & Removal Efficiency (DRE) Verification: Measuring percentage-level CF4 at both the inlet and outlet of thermal or plasma-based abatement systems (scrubbers) to calculate DRE and comply with greenhouse gas reduction mandates.
Carbon Footprint Tracking: Quantifying PFC (perfluorocarbon) emissions from semiconductor Fabs and electronics manufacturing facilities for carbon accounting.
•Electronic Specialty Gas Production & Blending
Process Gas Mixture Verification: Real-time quality control of customized process gas mixtures (such as CF4/O2, CF4/Ar, or CF4/He) used in precision microelectronics manufacturing.
Fluorochemical Quality Control: In-line purity analysis of bulk CF4 during chemical synthesis, distillation, and cylinder filling stages in specialty chemical plants.
•Power Transmission & High-Voltage Insulating Gas
SF6/CF4 Gas Mixture Analysis: Measuring the blending ratio of SF6 and CF4 gas mixtures used as insulating and arc-quenching media in high-voltage equipment (such as Gas-Insulated Switchgear - GIS) designed for extremely cold environments.
Measurement components and ranges
• CF4: 0 ~ 100%(Vol)
For detailed introduction, please refer to Infrared photometry analyzer.