Overview
The trace (ppm-level) NH3 gas analyzer is designed for continuous, quantitative monitoring of trace ammonia. It is widely used in SCR/SNCR deNOx ammonia slip monitoring for power and cement plants, impurity analysis in ultra-high-purity semiconductor gases, synthetic ammonia process control, and cold storage safety. Delivering precise measurements of NH3 in flue gas, high-purity raw gases, and ambient air, it prevents equipment clogging and corrosion from ammonium bisulfate, safeguards semiconductor wafer yields, and ensures process safety.
Principle
The measurement principle of high-precision laser absorption spectroscopy is based on the absorption of light of a specific wavelength by the detected molecule.
Use laser diode light sources of different wavelengths according to the gas molecules, and then measure the intensity of the transmitted light (I) and incident light (I0) at the detector (Lambert-Beer law) to know the current gas concentration measurement chamber.
Application
• DeNOx Ammonia Slip Monitoring (SCR/SNCR)
Power & Cement Plant Flue Gas: Continuous, real-time measurement of trace NH_3 (ammonia slip) in post-catalyst flue gas to optimize ammonia injection rates and minimize NO_x emissions.
Equipment Protection: Preventing the formation of ammonium bisulfate (ABS), which causes severe clogging and corrosion in downstream air preheaters and electrostatic precipitators.
• Biogas & Biomethane Purification
Biomethane Grid Injection Quality: Continuous monitoring of trace ammonia in upgraded biomethane to comply with gas grid injection and vehicle fuel standards (preventing pipeline corrosion and combustion NO_x emissions).
Biogas Upgrading Process Control: Measuring NH_3 slip after biological or chemical desulfurization and washing units to evaluate scrubbing efficiency.
• Semiconductor & High-Purity Gas Quality Control
Electronic-Grade Gas Purity: Detection of ppb/ppm-level ammonia impurities in nitrogen (N_2), hydrogen (H_2), and noble gases used in wafer fabrication to prevent chemical contamination.
Cleanroom Air Quality: Monitoring ambient cleanroom air for airborne molecular contamination (AMC) to safeguard photolithography processes.
• Chemical Synthesis & Fertilizer Production
Haber-Bosch Process Control: Monitoring trace ammonia in unreacted synthesis loops and tail gas of urea or ammonium nitrate production lines.
Catalyst Performance Tracking: Evaluating the conversion efficiency and life cycle of catalysts in ammonia-related chemical reactors.
• Refrigeration & Safety Monitoring
Industrial Cold Storage: High-sensitivity leak detection in large-scale ammonia (R717) refrigeration plants and food processing facilities.
Agricultural Emissions: Measuring ammonia concentrations in livestock waste treatment and agricultural emissions for environmental reporting.
Measurement components and ranges
• NH3: 0~ 10 up to1000ppm
For detailed introduction, please refer to Laser Spectroscopy Analyzer.