Overview
The Cl2 analyzer utilizes advanced ultraviolet photometry to measure dual gas components simultaneously using two UV-LEDs. Supporting versatile measuring ranges from ppm or Vol.-%, it effectively monitors Cl2.
The trace (ppm-level) Cl2 gas analyzer is designed for continuous, quantitative monitoring of trace chlorine gas. It is widely used in process off-gas, absorption/purification systems, and high-purity gas quality control across chlor-alkali, PVC, fine chemical, and semiconductor industries. Delivering precise measurements of residual Cl2, it evaluates purification and dechlorination efficiency, ensures emission compliance, and supports chlorine reaction endpoint and drying tower optimization—serving as critical equipment for environmental protection and process control.
The percentage-level(<30%) Cl2 gas analyzer is widely used in chlor-alkali, PVC, and fine chemical industries for chlorine purity monitoring, chlorination feed control, Cl2 inert gas ratio analysis, and liquid chlorine vaporizer outlet monitoring. Delivering precise measurements of Cl2 concentrations in process gas, it evaluates drying, condensation, and purification efficiency to enable seamless reaction process control and optimization.
Principle
UV-LED radiation is divided into measurement and reference paths by a beam splitter. The reference beam directly reaches the detector, which converts it into a reference voltage value. Using this reference signal, the aging effect of UV-LED can be almost completely compensated. The measuring beam enters the sample cell, and the gas in the sample cell is absorbed by the radiation in it. The absorption behavior is recorded by the measuring detector and used to calculate the gas concentration in the measuring cuvette.
Application
• Process Off-Gas & Emission Monitoring
Environmental Compliance: Continuous monitoring of trace Cl2 in process off-gas across chlor-alkali, PVC, and fine chemical industries.
CEMS Integration: Real-time stack emission monitoring in chemical and pharmaceutical facilities to ensure emission compliance.
• Purification & Dechlorination Systems
Scrubber & Absorption Tower Outlets: Measuring residual Cl2 to evaluate and optimize gas scrubbing and purification efficiency.
Dechlorination Units: Monitoring residual chlorine levels to verify the dechlorination efficiency of downstream treatment systems.
• High-Purity Gas Quality Control
Semiconductor Manufacturing: Purity verification of process and carrier gases to protect sensitive fabrication tools and prevent contamination.
High-Purity Chemical Gases: Raw material quality control in electronic-grade and high-purity chemical gas production.
• Process Optimization & Control
Chlorination Reaction Endpoints: Precise endpoint detection in organic synthesis and chlorination processes to optimize yield and minimize chemical waste.
Drying Tower Performance: Quantitative evaluation and performance tracking of chlorine drying systems.
• Production Purity & Vaporization Monitoring
Chlor-Alkali Purity Verification: Continuous analysis of produced chlorine gas composition to monitor product purity and process stability.
Liquid Chlorine Vaporizer Outlets: Real-time process analysis at the outlet of liquid chlorine vaporizers to ensure consistent gas phase concentration for downstream processes.
• Reaction Feed & Ratio Control
Chlorination Feed Control: Precise measurement of chlorine concentration in reactor feed lines to optimize raw material feeding and reaction efficiency.
Chlorine & Inert Gas Ratio Analysis: Monitoring and adjusting the mixture ratios of Cl2 and inert carrier gases to ensure safe and accurate chemical synthesis.
• Process Efficiency Evaluation
Drying & Condensation Assessment: Analyzing process gas composition to evaluate the efficiency of chlorine drying and condensation stages.
Purification System Tracking: Measuring chlorine concentration across purification units to optimize process control and achieve overall process optimization.
Measurement components and ranges
• Cl2: 0 ~ 100ppm up to 30%(Vol)
For detailed introduction, please refer to Ultraviolet photometry analyzer.